Sub-half-micron Lithography for ULSIs by Katsumi Suzuki
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Sub-half-micron Lithography for ULSIs
By Katsumi Suzuki

Sub-half-micron Lithography for ULSIs

Edited by See other recent books by Katsumi Suzuki See other recent books by Shinji Matsui See other recent books by Yukinori Ochiai
Format: Paperback

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Sub-half-micron Lithography for ULSIs by Katsumi Suzuki

Book Description

In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue a breakthrough in lithography technology is now needed. This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. The background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, X-ray lithography, electron-beam lithography, and focused ion-beam lithography are described in detail by experts in each area. The principles underlying each of these methods are illustrated at the beginning of each chapter to help the reader understand the basis of the different approaches.

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Book Details

ISBN: 9780521022347
ISBN-10: 0521022347
Format: Paperback
(246mm x 189mm x 18mm)
Pages: 344
Imprint: Cambridge University Press
Publisher: Cambridge University Press
Publish Date: 10-Nov-2005
Country of Publication: United Kingdom

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