X-ray Diffraction at Elevated Temperatures
A Method for In Situ Process Analysis
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X-ray Diffraction at Elevated Temperatures by Deborah D. L. Chung
Book DescriptionIn light of the growing importance and availability of intense x-ray sources and position-sensitive detectors, this book offers comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures. Coverage explores the uses of intense x-ray sources and position-sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis) for carrying out phase identification, texture analysis, and grain size measurement by way of in situ process analysis at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, chemical and electrical analysis.
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Book DetailsISBN: 9780471187264
(241mm x 160mm x 21mm)
Imprint: John Wiley & Sons Inc
Publisher: John Wiley and Sons Ltd
Publish Date: 26-Feb-1993
Country of Publication: United States
Books By Author Deborah D. L. Chung
Mechanical Behavior of Materials and Structures in Microelectronics: Volume 226, Hardback (January 1991)» View all books by Deborah D. L. Chung
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
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