X-ray Diffraction at Elevated Temperatures by Deborah D. L. Chung
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X-ray Diffraction at Elevated Temperatures
By Deborah D. L. Chung

X-ray Diffraction at Elevated Temperatures

A Method for In Situ Process Analysis

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Format: Hardback

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X-ray Diffraction at Elevated Temperatures by Deborah D. L. Chung

Book Description

In light of the growing importance and availability of intense x-ray sources and position-sensitive detectors, this book offers comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures. Coverage explores the uses of intense x-ray sources and position-sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis) for carrying out phase identification, texture analysis, and grain size measurement by way of in situ process analysis at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, chemical and electrical analysis.

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Book Details

ISBN: 9780471187264
ISBN-10: 0471187267
Format: Hardback
(241mm x 160mm x 21mm)
Pages: 268
Imprint: John Wiley & Sons Inc
Publisher: John Wiley and Sons Ltd
Publish Date: 26-Feb-1993
Country of Publication: United States

Other Editions...


Books By Author Deborah D. L. Chung

Mechanical Behavior of Materials and Structures in Microelectronics: Volume 226 by Deborah D. L. Chung Mechanical Behavior of Materials and Structures in Microelectronics: Volume 226, Hardback (January 1991)

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

» View all books by Deborah D. L. Chung

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